Photoresist

European patent · EP0402894 · Deleted

Register entry

Publication number
EP0402894
Application number
EP90111192
Kind
European patent with effect for Switzerland and Liechtenstein
Status
Deleted
Specification
Granted
Filed
Jun 13, 1990
Published
Dec 19, 1990
Granted
Jul 26, 1995
Deleted
Jun 30, 2000
Reason
Annual fee unpaid
IPC classes
G03F 7/027 (2006.01)
Priority
CH A 2254/89 16.06.1989
Filing language
German
Source
Swissreg

History

What the Federal Institute of Intellectual Property published about this title, newest first.

  1. Feb 15, 2001

    Deleted, fee unpaid

    Published in PIDTJ No 3 in 2001

  2. May 15, 1997

    Address changed

    Owner
    Ciba SC Holding AG, Klybeckstrasse 141, 4057 Basel → Ciba Specialty Chemicals Holding Inc., Klybeckstrasse 141, 4057 Basel

    Published in PIDTJ No 9 in 1997

  3. Oct 31, 1996

    Transferred

    Owner
    CIBA-GEIGY AG, Klybeckstrasse 141, 4002 Basel → Ciba SC Holding AG, Klybeckstrasse 141, 4057 Basel

    Published in PIDTJ No 20 in 1996

  4. Sep 15, 1995

    Granted

    Published in PIDTJ No 17 in 1995

Parties

Holder

Ciba Specialty Chemicals Holding Inc.

Klybeckstrasse 141, 4057 Basel

Inventor

Kurt, Meier, Dr.

CH-4106 Therwil

Lunn, Robert James, Dr.

Bar Hill, Cambridge CB3 8TJ, GB

Kroehnke, Christoph, Dr.

D-7800 Freiburg/Munzingen, DE

Eugster, Giuliano

CH-4452 Itingen

The register names each party by name and address. A holder or agent is linked to an organization where exactly one entity of the commercial register bears its name; the street of a party not so recognised is not shown here.